- DC Sputter System: High power Plasma Sputter coater with Rotary Stage (3 Heads).
- Plasma Cleaner System: Low pressure plasma system. Process development, Plasma cleaner, Plasma asher, Plasma etcher, Plasma activation
- Gas Mixing Chamber: 2 Channel with flowmeters, Ceramic coating processes
- Microscope 40x+

- 4 GHz Network Analyser

- 1.3 GHz Network Analyser

- 1.5 GHz Spectrum Analyser

- 0-220 MHz RF Amplifier (50 dB)

- 1 GHz RF Signal Generator

- 200 MHz Arbitrary Function Generator

- 350 MHz 4-Channel Oscilloscope

- 75 MHz Pulser/Receiver with 40 dB amplifier/attenuator

- 8-core, 64 GB RAM Workstation

- 4-core, 32 GB RAM Workstation

- COMSOL, MATLAB Licences

- XYZ stage with 25 µm step size

- 2.2 MHz to 10 MHz Ultrasonic transducers

- 10 MHz linear US transducer arrays

- FPGA and µC kits